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Deposition of hydrogenated amorphous carbon films from CH~4/Ar plasmas: Ar dilution effects
Deposition of hydrogenated amorphous carbon films from CH~4/Ar plasmas: Ar dilution effects
Deposition of hydrogenated amorphous carbon films from CH~4/Ar plasmas: Ar dilution effects
Valentini, L. (Autor:in) / Kenny, J. M. (Autor:in) / Mariotto, G. (Autor:in) / Tosi, P. (Autor:in)
JOURNAL OF MATERIALS SCIENCE ; 36 ; 5295-5300
01.01.2001
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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