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Deposition of hydrogenated amorphous carbon nitride films by dielectric barrier discharge plasmas

Niu, J. / Zhang, L. / Zhang, Z. / Liu, D. / Liu, Y. / Feng, Z.

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Deposition of hydrogenated amorphous carbon nitride films by dielectric barrier discharge plasmas

Niu, J. / Zhang, L. / Zhang, Z. / Liu, D. / Liu, Y. / Feng, Z.

Deposition of hydrogenated amorphous carbon nitride films by dielectric barrier discharge plasmas

Niu, J. / Zhang, L. / Zhang, Z. / Liu, D. / Liu, Y. / Feng, Z.

Access

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Deposition of hydrogenated amorphous carbon nitride films by dielectric barrier discharge plasmas

Contributors:

Niu, J. (author) / Zhang, L. (author) / Zhang, Z. (author) / Liu, D. (author) / Liu, Y. (author) / Feng, Z. (author)

Published in:

APPLIED SURFACE SCIENCE ; 256 ; 6887-6892

Publication date:

2010-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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