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Long time stability of ITO/NiPc/ZnO/Al devices with ZnO buffer layer formed by atomic layer deposition technique-impedance spectroscopy analysis
Long time stability of ITO/NiPc/ZnO/Al devices with ZnO buffer layer formed by atomic layer deposition technique-impedance spectroscopy analysis
Long time stability of ITO/NiPc/ZnO/Al devices with ZnO buffer layer formed by atomic layer deposition technique-impedance spectroscopy analysis
Stakhira, P. Y. (Autor:in) / Grygorchak, I. I. (Autor:in) / Cherpak, V. V. (Autor:in) / Ivastchyshyn, F. O. (Autor:in) / Volynyuk, D. Y. (Autor:in) / Luka, G. (Autor:in) / Godlewski, M. (Autor:in) / Guziewicz, E. (Autor:in) / Pakhomov, G. L. (Autor:in) / Hotra, Z. Y. (Autor:in)
01.01.2010
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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