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ATOMIC LAYER DEPOSITION WITH PASSIVATION TREATMENT
A method includes: 1) performing an atomic layer deposition cycle including (a) introducing precursors into a deposition chamber housing a substrate to deposit a material on the substrate; and (b) introducing a passivation gas into the deposition chamber to passivate a surface of the material; and 2) repeating 1) a plurality of times to form a film of the material.
ATOMIC LAYER DEPOSITION WITH PASSIVATION TREATMENT
A method includes: 1) performing an atomic layer deposition cycle including (a) introducing precursors into a deposition chamber housing a substrate to deposit a material on the substrate; and (b) introducing a passivation gas into the deposition chamber to passivate a surface of the material; and 2) repeating 1) a plurality of times to form a film of the material.
ATOMIC LAYER DEPOSITION WITH PASSIVATION TREATMENT
ATOMLAGENABSCHEIDUNG MIT PASSIVIERUNGSBEHANDLUNG
DÉPÔT DE COUCHE ATOMIQUE AVEC TRAITEMENT DE PASSIVATION
PRINZ FRIEDRICH B (Autor:in) / XU SHICHENG (Autor:in) / ENGLISH TIMOTHY (Autor:in) / PROVINE JOHN (Autor:in) / THIAN DICKSON (Autor:in) / TORGERSEN JAN (Autor:in)
20.05.2020
Patent
Elektronische Ressource
Englisch
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