Determining the Complete Residual Stress Tensors in SOS Hetero-Epitaxial Thin Film Systems by the Technique of X-Ray Diffraction: Fid-Bau Portal

Determining the Complete Residual Stress Tensors in SOS Hetero-Epitaxial Thin Film Systems by the Technique of X-Ray Diffraction

Liu, M. / Zhang, L.C. / Brawley, A. / Atanackovic, P. / Duvall, S.

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Determining the Complete Residual Stress Tensors in SOS Hetero-Epitaxial Thin Film Systems by the Technique of X-Ray Diffraction

Liu, M. / Zhang, L.C. / Brawley, A. / Atanackovic, P. / Duvall, S.

Determining the Complete Residual Stress Tensors in SOS Hetero-Epitaxial Thin Film Systems by the Technique of X-Ray Diffraction

Liu, M. / Zhang, L.C. / Brawley, A. / Atanackovic, P. / Duvall, S.

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Titel:

Determining the Complete Residual Stress Tensors in SOS Hetero-Epitaxial Thin Film Systems by the Technique of X-Ray Diffraction

Beteiligte:

Liu, M. (Autor:in) / Zhang, L.C. (Autor:in) / Brawley, A. (Autor:in) / Atanackovic, P. (Autor:in) / Duvall, S. (Autor:in) / Wang, J. / Mathew, P. / Li, X. / Huang, C. / Zhu, H.

Erschienen in:

Advances in Materials Processing IX ; 742-747

KEY ENGINEERING MATERIALS ; 443

Erscheinungsdatum:

01.01.2010

Format / Umfang:

6 pages

ISSN:

1013-9826

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.11

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