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Aluminosilicate coating prepared by low pressure chemical vapour deposition using TEOS and AlCl~3 as precursors
Aluminosilicate coating prepared by low pressure chemical vapour deposition using TEOS and AlCl~3 as precursors
Aluminosilicate coating prepared by low pressure chemical vapour deposition using TEOS and AlCl~3 as precursors
Chen, Z.F. (Autor:in)
SURFACE ENGINEERING -LONDON- ; 26 ; 607-609
01.01.2010
3 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
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