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Aluminosilicate coating prepared by low pressure chemical vapour deposition using TEOS and AlCl~3 as precursors
Aluminosilicate coating prepared by low pressure chemical vapour deposition using TEOS and AlCl~3 as precursors
Aluminosilicate coating prepared by low pressure chemical vapour deposition using TEOS and AlCl~3 as precursors
Chen, Z.F. (author)
SURFACE ENGINEERING -LONDON- ; 26 ; 607-609
2010-01-01
3 pages
Article (Journal)
English
DDC:
620.44
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