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Optimization of inductively coupled plasma deep etching of GaN and etching damage analysis
Optimization of inductively coupled plasma deep etching of GaN and etching damage analysis
Optimization of inductively coupled plasma deep etching of GaN and etching damage analysis
APPLIED SURFACE SCIENCE ; 257 ; 2700-2706
2011-01-01
7 pages
Article (Journal)
English
DDC:
621.35
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