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Residual stress analysis on silicon wafer surface layers induced by ultra-precision grinding
Residual stress analysis on silicon wafer surface layers induced by ultra-precision grinding
Residual stress analysis on silicon wafer surface layers induced by ultra-precision grinding
RARE METALS -BEIJING- ENGLISH EDITION ; 30 ; 278-281
01.01.2011
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
669
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