Synthesis and analysis of silicon nanowire below Si-Au eutectic temperatures using very high frequency plasma enhanced chemical vapor deposition: Fid-Bau Portal

Synthesis and analysis of silicon nanowire below Si-Au eutectic temperatures using very high frequency plasma enhanced chemical vapor deposition

Hamidinezhad, H. / Wahab, Y. / Othaman, Z. / Ismail, A. K.

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Synthesis and analysis of silicon nanowire below Si-Au eutectic temperatures using very high frequency plasma enhanced chemical vapor deposition

Hamidinezhad, H. / Wahab, Y. / Othaman, Z. / Ismail, A. K.

Synthesis and analysis of silicon nanowire below Si-Au eutectic temperatures using very high frequency plasma enhanced chemical vapor deposition

Hamidinezhad, H. / Wahab, Y. / Othaman, Z. / Ismail, A. K.

Zugriff

Zugriff über TIB

Verfügbarkeit in meiner Bibliothek prüfen

Bestellung bei Subito €

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Titel:

Synthesis and analysis of silicon nanowire below Si-Au eutectic temperatures using very high frequency plasma enhanced chemical vapor deposition

Beteiligte:

Hamidinezhad, H. (Autor:in) / Wahab, Y. (Autor:in) / Othaman, Z. (Autor:in) / Ismail, A. K. (Autor:in)

Erschienen in:

APPLIED SURFACE SCIENCE ; 257 ; 9188-9192

Erscheinungsdatum:

01.01.2011

Format / Umfang:

5 pages

ISSN:

0169-4332

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 621.35

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Mebarki, B. / Sumiya, S. / Yoshida, R. et al. | British Library Online Contents | 1999

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Hamidinezhad, H. / Wahab, Y. / Othaman, Z. | British Library Online Contents | 2011

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