High-rate chemical vapor deposition of nanocrystalline silicon carbide films by radio frequency thermal plasma

Liao, F. / Park, S. / Larson, J. M. et al. | British Library Online Contents | 2003

Microstructure and Electric Transport Characteristic of Microcrystalline Silicon Films Fabricated by Very High Frequency Plasma Enhanced Chemical Vapor Deposition

Wang, X. / Huang, R. / Song, J. et al. | British Library Online Contents | 2011

Development of p-type microcrystalline silicon carbon alloy films by the very high frequency plasma-enhanced chemical vapor deposition technique

Jana, T. / Dasgupta, A. / Ray, S. | British Library Online Contents | 2001

Synthesis and analysis of silicon nanowire below Si-Au eutectic temperatures using very high frequency plasma enhanced chemical vapor deposition

Hamidinezhad, H. / Wahab, Y. / Othaman, Z. et al. | British Library Online Contents | 2011

Structural and photo-luminescence properties of nanocrystalline silicon films deposited at low temperature by plasma-enhanced chemical vapor deposition

Ali, A. M. / Inokuma, T. / Hasegawa, S. | British Library Online Contents | 2006