Development of p-type microcrystalline silicon carbon alloy films by the very high frequency plasma-enhanced chemical vapor deposition technique

Jana, T. / Dasgupta, A. / Ray, S. | British Library Online Contents | 2001

Nanocrystalline Silicon Films Grown at High Pressure in Very High Frequency Plasma Enhanced Chemical Vapor Deposition System

Guo, Y.Q. / Huang, R. / Song, J. et al. | British Library Online Contents | 2011

Influence of substrate on the growth of microcrystalline silicon thin films deposited by plasma enhanced chemical vapor deposition

Qi, L. / Hu, Z. / Li, W. et al. | British Library Online Contents | 2012

Synthesis and analysis of silicon nanowire below Si-Au eutectic temperatures using very high frequency plasma enhanced chemical vapor deposition

Hamidinezhad, H. / Wahab, Y. / Othaman, Z. et al. | British Library Online Contents | 2011

Microstructure and mechanical properties of AlN films obtained by plasma enhanced chemical vapor deposition

Sánchez, G. / Abdallah, B. / Tristant, P. et al. | British Library Online Contents | 2009