Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
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Influence of pulsed substrate bias on the structure and properties of Ti-Al-N films deposited by cathodic vacuum arc
Influence of pulsed substrate bias on the structure and properties of Ti-Al-N films deposited by cathodic vacuum arc
Influence of pulsed substrate bias on the structure and properties of Ti-Al-N films deposited by cathodic vacuum arc
Zhang, G. P. (Autor:in) / Gao, G. J. (Autor:in) / Wang, X. Q. (Autor:in) / Lv, G. H. (Autor:in) / Zhou, L. (Autor:in) / Chen, H. (Autor:in) / Pang, H. (Autor:in) / Yang, S. Z. (Autor:in)
APPLIED SURFACE SCIENCE ; 258 ; 7274-7279
01.01.2012
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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