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Characterization of Ti-Zr-N films deposited by cathodic vacuum arc with different substrate bias
Characterization of Ti-Zr-N films deposited by cathodic vacuum arc with different substrate bias
Characterization of Ti-Zr-N films deposited by cathodic vacuum arc with different substrate bias
Niu, E. W. (Autor:in) / Li, L. (Autor:in) / Lv, G. H. (Autor:in) / Chen, H. (Autor:in) / Li, X. Z. (Autor:in) / Yang, X. Z. (Autor:in) / Yang, S. Z. (Autor:in)
APPLIED SURFACE SCIENCE ; 254 ; 3909-3914
01.01.2008
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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