Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
High Uniformity with Reduced Surface Roughness of Chloride Based CVD Process on 100mm 4^o Off-Axis 4H-SiC
High Uniformity with Reduced Surface Roughness of Chloride Based CVD Process on 100mm 4^o Off-Axis 4H-SiC
High Uniformity with Reduced Surface Roughness of Chloride Based CVD Process on 100mm 4^o Off-Axis 4H-SiC
Das, H. (Autor:in) / Sunkari, S. (Autor:in) / Oldham, T. (Autor:in) / Casady, J. (Autor:in)
MATERIALS SCIENCE FORUM ; 717/720 ; 93-96
01.01.2012
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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