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High Uniformity with Reduced Surface Roughness of Chloride Based CVD Process on 100mm 4^o Off-Axis 4H-SiC
High Uniformity with Reduced Surface Roughness of Chloride Based CVD Process on 100mm 4^o Off-Axis 4H-SiC
High Uniformity with Reduced Surface Roughness of Chloride Based CVD Process on 100mm 4^o Off-Axis 4H-SiC
Das, H. ( author ) / Sunkari, S. ( author ) / Oldham, T. ( author ) / Casady, J. ( author )
MATERIALS SCIENCE FORUM ; 717/720 ; 93-96
2012-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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