Effects of negative substrate bias voltage on the structure and properties of aluminum oxide films prepared by DC reactive magnetron sputtering: Fid-Bau Portal

Effects of negative substrate bias voltage on the structure and properties of aluminum oxide films prepared by DC reactive magnetron sputtering

Tang, X. / Luo, F. / Ou, F. / Zhou, W. / Zhu, D. / Huang, Z.

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Effects of negative substrate bias voltage on the structure and properties of aluminum oxide films prepared by DC reactive magnetron sputtering

Tang, X. / Luo, F. / Ou, F. / Zhou, W. / Zhu, D. / Huang, Z.

Effects of negative substrate bias voltage on the structure and properties of aluminum oxide films prepared by DC reactive magnetron sputtering

Tang, X. / Luo, F. / Ou, F. / Zhou, W. / Zhu, D. / Huang, Z.

Zugriff

Zugriff über TIB

Verfügbarkeit in meiner Bibliothek prüfen

Bestellung bei Subito €

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Titel:

Effects of negative substrate bias voltage on the structure and properties of aluminum oxide films prepared by DC reactive magnetron sputtering

Beteiligte:

Tang, X. (Autor:in) / Luo, F. (Autor:in) / Ou, F. (Autor:in) / Zhou, W. (Autor:in) / Zhu, D. (Autor:in) / Huang, Z. (Autor:in)

Erschienen in:

APPLIED SURFACE SCIENCE ; 259 ; 448-453

Erscheinungsdatum:

01.01.2012

Format / Umfang:

6 pages

ISSN:

0169-4332

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 621.35

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Rogozin, A. / Vinnichenko, M. / Shevchenko, N. et al. | British Library Online Contents | 2007

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Lv, Y. / Ji, L. / Liu, X. et al. | British Library Online Contents | 2012

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