Effects of negative substrate bias voltage on the structure and properties of aluminum oxide films prepared by DC reactive magnetron sputtering: Fid-Bau Portal

Effects of negative substrate bias voltage on the structure and properties of aluminum oxide films prepared by DC reactive magnetron sputtering

Tang, X. / Luo, F. / Ou, F. / Zhou, W. / Zhu, D. / Huang, Z.

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Effects of negative substrate bias voltage on the structure and properties of aluminum oxide films prepared by DC reactive magnetron sputtering

Tang, X. / Luo, F. / Ou, F. / Zhou, W. / Zhu, D. / Huang, Z.

Effects of negative substrate bias voltage on the structure and properties of aluminum oxide films prepared by DC reactive magnetron sputtering

Tang, X. / Luo, F. / Ou, F. / Zhou, W. / Zhu, D. / Huang, Z.

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Check availability in my library

Order at Subito €

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Document information

Title:

Effects of negative substrate bias voltage on the structure and properties of aluminum oxide films prepared by DC reactive magnetron sputtering

Contributors:

Tang, X. (author) / Luo, F. (author) / Ou, F. (author) / Zhou, W. (author) / Zhu, D. (author) / Huang, Z. (author)

Published in:

APPLIED SURFACE SCIENCE ; 259 ; 448-453

Publication date:

2012-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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