Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Influence of the substrate and nitrogen amount on the microstructural and optical properties of thin r.f.-sputtered ZnO films treated by rapid thermal annealing
Influence of the substrate and nitrogen amount on the microstructural and optical properties of thin r.f.-sputtered ZnO films treated by rapid thermal annealing
Influence of the substrate and nitrogen amount on the microstructural and optical properties of thin r.f.-sputtered ZnO films treated by rapid thermal annealing
Nicolescu, M. (Autor:in) / Anastasescu, M. (Autor:in) / Preda, S. (Autor:in) / Stroescu, H. (Autor:in) / Stoica, M. (Autor:in) / Teodorescu, V. S. (Autor:in) / Aperathitis, E. (Autor:in) / Kampylafka, V. (Autor:in) / Modreanu, M. (Autor:in) / Zaharescu, M. (Autor:in)
APPLIED SURFACE SCIENCE ; 261 ; 815-823
01.01.2012
9 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Influence of rapid-thermal-annealing temperature on properties of rf-sputtered SnOx thin films
British Library Online Contents | 2015
|British Library Online Contents | 2004
|Microstructural improvement of sputtered ZrO2 thin films by substrate biasing
British Library Online Contents | 2005
|British Library Online Contents | 2005
|Annealing effects of tantalum thin films sputtered on [001] silicon substrate
British Library Online Contents | 2001
|