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Effects of pulse bias on structure and properties of silicon/nitrogen-incorporated diamond-like carbon films prepared by plasma-enhanced chemical vapor deposition
Effects of pulse bias on structure and properties of silicon/nitrogen-incorporated diamond-like carbon films prepared by plasma-enhanced chemical vapor deposition
Effects of pulse bias on structure and properties of silicon/nitrogen-incorporated diamond-like carbon films prepared by plasma-enhanced chemical vapor deposition
Nakazawa, H. (Autor:in) / Miura, S. (Autor:in) / Kamata, R. (Autor:in) / Okuno, S. (Autor:in) / Suemitsu, M. (Autor:in) / Abe, T. (Autor:in)
APPLIED SURFACE SCIENCE ; 264 ; 625-632
01.01.2013
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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