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Effects of pulse bias on structure and properties of silicon/nitrogen-incorporated diamond-like carbon films prepared by plasma-enhanced chemical vapor deposition
Effects of pulse bias on structure and properties of silicon/nitrogen-incorporated diamond-like carbon films prepared by plasma-enhanced chemical vapor deposition
Effects of pulse bias on structure and properties of silicon/nitrogen-incorporated diamond-like carbon films prepared by plasma-enhanced chemical vapor deposition
Nakazawa, H. (author) / Miura, S. (author) / Kamata, R. (author) / Okuno, S. (author) / Suemitsu, M. (author) / Abe, T. (author)
APPLIED SURFACE SCIENCE ; 264 ; 625-632
2013-01-01
8 pages
Article (Journal)
English
DDC:
621.35
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