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Fabrication of 30-nm-Pitched CoPt Magnetic Dot Arrays Using 30-keV-Electron Beam Lithography and Ion Milling for Patterned Media
Fabrication of 30-nm-Pitched CoPt Magnetic Dot Arrays Using 30-keV-Electron Beam Lithography and Ion Milling for Patterned Media
Fabrication of 30-nm-Pitched CoPt Magnetic Dot Arrays Using 30-keV-Electron Beam Lithography and Ion Milling for Patterned Media
Mohamad, Z. (author) / Alip, R.I. (author) / Komori, T. (author) / Akahane, T. (author) / Zhang, H. (author) / Huda, M. (author) / Yin, Y. (author) / Hosaka, S. (author) / Hosaka, S.
2013-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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