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Characterization of (4,4)- and (5,3)-Type Stacking-Faults in 4deg.-Off 4H-SiC Epitaxial Wafers by Synchrotron X-Ray Topography and by Photo-Luminescence Spectroscopy
Characterization of (4,4)- and (5,3)-Type Stacking-Faults in 4deg.-Off 4H-SiC Epitaxial Wafers by Synchrotron X-Ray Topography and by Photo-Luminescence Spectroscopy
Characterization of (4,4)- and (5,3)-Type Stacking-Faults in 4deg.-Off 4H-SiC Epitaxial Wafers by Synchrotron X-Ray Topography and by Photo-Luminescence Spectroscopy
Yamashita, T. (Autor:in) / Matsuhata, H. (Autor:in) / Miyasaka, Y. (Autor:in) / Odawara, M. (Autor:in) / Momose, K. (Autor:in) / Sato, T. (Autor:in) / Kitabatake, M. (Autor:in) / Lebedev, A.A. / Davydov, S.Y. / Ivanov, P.A.
01.01.2013
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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Generation of Oxidation Induced Stacking Faults in Cz Silicon Wafers
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