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Influence of N"2/Ar-flow ratio on crystal quality and electrical properties of ScAlN thin film prepared by DC reactive magnetron sputtering
Influence of N"2/Ar-flow ratio on crystal quality and electrical properties of ScAlN thin film prepared by DC reactive magnetron sputtering
Influence of N"2/Ar-flow ratio on crystal quality and electrical properties of ScAlN thin film prepared by DC reactive magnetron sputtering
Yang, J. c. (Autor:in) / Meng, X. q. (Autor:in) / Yang, C. t. (Autor:in) / Fu, W. j. (Autor:in)
APPLIED SURFACE SCIENCE ; 282 ; 578-582
01.01.2013
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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