Influence of N"2/Ar-flow ratio on crystal quality and electrical properties of ScAlN thin film prepared by DC reactive magnetron sputtering: Fid-Bau Portal

Influence of N"2/Ar-flow ratio on crystal quality and electrical properties of ScAlN thin film prepared by DC reactive magnetron sputtering

Yang, J. c. / Meng, X. q. / Yang, C. t. / Fu, W. j.

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Influence of N"2/Ar-flow ratio on crystal quality and electrical properties of ScAlN thin film prepared by DC reactive magnetron sputtering

Yang, J. c. / Meng, X. q. / Yang, C. t. / Fu, W. j.

Influence of N"2/Ar-flow ratio on crystal quality and electrical properties of ScAlN thin film prepared by DC reactive magnetron sputtering

Yang, J. c. / Meng, X. q. / Yang, C. t. / Fu, W. j.

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Check availability in my library

Order at Subito €

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Document information

Title:

Influence of N"2/Ar-flow ratio on crystal quality and electrical properties of ScAlN thin film prepared by DC reactive magnetron sputtering

Contributors:

Yang, J. c. (author) / Meng, X. q. (author) / Yang, C. t. (author) / Fu, W. j. (author)

Published in:

APPLIED SURFACE SCIENCE ; 282 ; 578-582

Publication date:

2013-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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