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Atomic layer deposited Al"2O"3 films for anti-reflectance and surface passivation applications
Atomic layer deposited Al"2O"3 films for anti-reflectance and surface passivation applications
Atomic layer deposited Al"2O"3 films for anti-reflectance and surface passivation applications
Zhu, L. Q. (Autor:in) / Liu, Y. H. (Autor:in) / Zhang, H. L. (Autor:in) / Xiao, H. (Autor:in) / Guo, L. Q. (Autor:in)
APPLIED SURFACE SCIENCE ; 288 ; 430-434
01.01.2014
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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