Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Ohmic contact formation process on low n-type gallium arsenide (GaAs) using indium gallium zinc oxide (IGZO)
Ohmic contact formation process on low n-type gallium arsenide (GaAs) using indium gallium zinc oxide (IGZO)
Ohmic contact formation process on low n-type gallium arsenide (GaAs) using indium gallium zinc oxide (IGZO)
Yang, S. U. (Autor:in) / Jung, W. S. (Autor:in) / Lee, I. Y. (Autor:in) / Jung, H. W. (Autor:in) / Kim, G. H. (Autor:in) / Park, J. H. (Autor:in)
MATERIALS RESEARCH BULLETIN ; 50 ; 409-412
01.01.2014
4 pages
Aufsatz (Zeitschrift)
Englisch
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Europäisches Patentamt | 2018
|Oxide formation during etching of gallium arsenide
British Library Online Contents | 2002
|Microbial toxicity of gallium- and indium-based oxide and arsenide nanoparticles
Taylor & Francis Verlag | 2020
|Gallium Arsenide (GaAs) Solar Cell Modeling Studies
NTIS | 1980
|Gallium arsenide (GaAs) solar cell modeling studies
NTRS | 1980
|