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FT IR spectroscopy of nitric acid oxidation of silicon with hafnium oxide very thin layer
FT IR spectroscopy of nitric acid oxidation of silicon with hafnium oxide very thin layer
FT IR spectroscopy of nitric acid oxidation of silicon with hafnium oxide very thin layer
Kopani, M. (Autor:in) / Mikula, M. (Autor:in) / Pincik, E. (Autor:in) / Kobayashi, H. (Autor:in) / Takahashi, M. (Autor:in)
APPLIED SURFACE SCIENCE ; 301 ; 24-27
01.01.2014
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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