IR study of fundamental chemical reactions in atomic layer deposition of HfO2 with tetrakis(ethylmethylamino)hafnium (TEMAH), ozone, and water vapor

Hirose, F. / Kinoshita, Y. / Kanomata, K. et al. | British Library Online Contents | 2012

Hafnium silicon oxide films prepared by atomic layer deposition

Kukli, K. / Ritala, M. / Leskela, M. et al. | British Library Online Contents | 2004

Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon

Kanomata, K. / Tokoro, K. / Imai, T. et al. | British Library Online Contents | 2016

Reflection absorption infrared spectroscopy during atomic layer deposition of HfO2 films from tetrakis(ethylmethylamido)hafnium and water

Sperling, B. A. / Kimes, W. A. / Maslar, J. E. | British Library Online Contents | 2010

Atomic layer deposition of hafnium and zirconium silicate thin films

Vainonen-Ahlgren, E. / Tois, E. / Ahlgren, T. et al. | British Library Online Contents | 2003