Chemical mechanical polishing by colloidal silica-based slurry for micro-scratch reduction

Ahn, Y. / Yoon, J. Y. / Baek, C. W. et al. | British Library Online Contents | 2004

Use of anionic surfactants for selective polishing of silicon dioxide over silicon nitride films using colloidal silica-based slurries

Penta, N. K. / Amanapu, H. P. / Peethala, B. C. et al. | British Library Online Contents | 2013

Electrochemical Testing of Tantalum and Copper in Chemical Mechanical Polishing Slurries

Liu, Z. / Li, H. / Schmidt, R. et al. | British Library Conference Proceedings | 2006

Chemical Mechanical Polishing of Computer Hard Disk Substrate in Colloidal SiO~2 Slurry

Lei, H. | British Library Online Contents | 2002

Chemical mechanical polishing of stainless steel foil as flexible substrate

Hu, X. / Song, Z. / Liu, W. et al. | British Library Online Contents | 2012