Localization of anodic etching by thick polymer masks, and the composition of surface layers in electrochemical marking of aluminum alloy parts

Volodina, G. F. / Zvonkii, V. G. / Zuev, A. A. et al. | British Library Online Contents | 2005

Graphene masks as passivation layers in the electrochemical etching of silicon

Fang, C. / Shapter, J. G. / Voelcker, N. H. et al. | British Library Online Contents | 2014

Surface analytical studies of Ar-plasma etching of thin heptadecafluoro-1-decene plasma polymer films

Wang, X. / Grundmeier, G. | British Library Online Contents | 2006

Plasma etching of thermoset polymer films for microchannels

Holland, A. / Cher, C. / Rosengarten, G. et al. | British Library Online Contents | 2006

The use of titanium and titanium dioxide as masks for deep silicon etching

Powell, O. / Sweatman, D. / Harrison, H. B. | British Library Online Contents | 2006