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Nanoscale structural damage due to focused ion beam milling of silicon with Ga ions
Nanoscale structural damage due to focused ion beam milling of silicon with Ga ions
Nanoscale structural damage due to focused ion beam milling of silicon with Ga ions
Salvati, E. (Autor:in) / Brandt, L.R. (Autor:in) / Papadaki, C. (Autor:in) / Zhang, H. (Autor:in) / Mousavi, S.M. (Autor:in) / Wermeille, D. (Autor:in) / Korsunsky, A.M. (Autor:in)
MATERIALS LETTERS ; 213 ; 346-349
01.01.2018
4 pages
Aufsatz (Zeitschrift)
Unbekannt
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