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Atomic layer deposition HfO2 capping layer effect on porous low dielectric constant materials
Atomic layer deposition HfO2 capping layer effect on porous low dielectric constant materials
Atomic layer deposition HfO2 capping layer effect on porous low dielectric constant materials
Cheng, Y. L. (Autor:in) / Kao, K. C. (Autor:in) / Huang, C. J. (Autor:in) / Chen, G. S. (Autor:in) / Fang, J. S. (Autor:in)
APPLIED SURFACE SCIENCE ; 354 ; 115-119
01.01.2015
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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