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Effects of precursors on nucleation in atomic layer deposition of HfO2
Effects of precursors on nucleation in atomic layer deposition of HfO2
Effects of precursors on nucleation in atomic layer deposition of HfO2
Aarik, J. (Autor:in) / Aidla, A. (Autor:in) / Kikas, A. (Autor:in) / Kaambre, T. (Autor:in) / Rammula, R. (Autor:in) / Ritslaid, P. (Autor:in) / Uustare, T. (Autor:in) / Sammelselg, V. (Autor:in)
APPLIED SURFACE SCIENCE ; 230 ; 292-300
01.01.2004
9 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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