Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric

Lee, Da Jung / Lim, Jung Wook / Mun, Jae Kyoung et al. | British Library Online Contents | 2016

Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric

Lee, Da Jung / Lim, Jung Wook / Mun, Jae Kyoung et al. | British Library Online Contents | 2016

Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers

Jang, Jin Hyuk / Kim, Nahae / Li, Xinlin et al. | British Library Online Contents | 2019

Characteristics of sandwich-structured Al2O3/HfO2/Al2O3 gate dielectric films on ultra-thin silicon-on-insulator substrates

Cheng, X. / Song, Z. / Jiang, J. et al. | British Library Online Contents | 2005

Optical and electrical properties of plasma-oxidation derived HfO2 gate dielectric films

He, G. / Zhu, L. Q. / Liu, M. et al. | British Library Online Contents | 2007