Electrical and reliability characteristics of HfO2 gate dielectric treated in N2 and NH3 plasma atmosphere

Kim, J. H. / Choi, K. J. / Yoon, S. G. | British Library Online Contents | 2005

Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma

Huang, L. T. / Chang, M. L. / Huang, J. J. et al. | British Library Online Contents | 2013

HfO2 as gate dielectric on Ge: Interfaces and deposition techniques

Caymax, M. / Van Elshocht, S. / Houssa, M. et al. | British Library Online Contents | 2006

Deposition temperature dependent optical and electrical properties of ALD HfO2 gate dielectrics pretreated with tetrakisethylmethylamino hafnium

Gao, J. / He, G. / Zhang, J.W. et al. | British Library Online Contents | 2015

Characterization of HfO2 dielectric films with low energy SIMS

Jiang, Z. X. / Kim, K. / Lerma, J. et al. | British Library Online Contents | 2006