Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Electrical, optical, structural and chemical properties of Al2TiO5 films for high-к gate dielectric applications
Electrical, optical, structural and chemical properties of Al2TiO5 films for high-к gate dielectric applications
Electrical, optical, structural and chemical properties of Al2TiO5 films for high-к gate dielectric applications
Addepalli, Suresh (Autor:in) / Kolla, Lakshmi Ganapathi (Autor:in) / Suda, Uthanna (Autor:in)
Materials science in semiconductor processing ; 57 ; 137-146
01.01.2017
10 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
| British Library Online Contents | 2017
Optical and electrical properties of plasma-oxidation derived HfO2 gate dielectric films
| British Library Online Contents | 2007
Structural and interfacial properties of high-k HfOxNy gate dielectric films
| British Library Online Contents | 2006
An initial study on SiCw-reinforced Al2TiO5 composites
| British Library Online Contents | 2000
High-damping and high-rigidity composites of Al2TiO5–MgTi2O5 ceramics and acrylic resin
| British Library Online Contents | 2009