A platform for research: civil engineering, architecture and urbanism
Electrical, optical, structural and chemical properties of Al2TiO5 films for high-к gate dielectric applications
Electrical, optical, structural and chemical properties of Al2TiO5 films for high-к gate dielectric applications
Electrical, optical, structural and chemical properties of Al2TiO5 films for high-к gate dielectric applications
Addepalli, Suresh (author) / Kolla, Lakshmi Ganapathi (author) / Suda, Uthanna (author)
Materials science in semiconductor processing ; 57 ; 137-146
2017-01-01
10 pages
Article (Journal)
English
DDC:
621.38152
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2017
|Optical and electrical properties of plasma-oxidation derived HfO2 gate dielectric films
British Library Online Contents | 2007
|Structural and interfacial properties of high-k HfOxNy gate dielectric films
British Library Online Contents | 2006
|An initial study on SiCw-reinforced Al2TiO5 composites
British Library Online Contents | 2000
|High-damping and high-rigidity composites of Al2TiO5–MgTi2O5 ceramics and acrylic resin
British Library Online Contents | 2009
|