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Fundamentals of Ge1−xSnx and SiyGe1−x-ySnx RPCVD epitaxy
Fundamentals of Ge1−xSnx and SiyGe1−x-ySnx RPCVD epitaxy
Fundamentals of Ge1−xSnx and SiyGe1−x-ySnx RPCVD epitaxy
Margetis, Joe (Autor:in) / Mosleh, Aboozar (Autor:in) / Ghetmiri, Seyed Amir (Autor:in) / Al-Kabi, Sattar (Autor:in) / Dou, Wei (Autor:in) / Du, Wei (Autor:in) / Bhargava, Nupur (Autor:in) / Yu, Shui-Qing (Autor:in) / Profijt, Harald (Autor:in) / Kohen, David (Autor:in)
Materials science in semiconductor processing ; 70 ; 38-43
01.01.2017
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
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