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Very high frequency plasma reactant for atomic layer deposition
Very high frequency plasma reactant for atomic layer deposition
Very high frequency plasma reactant for atomic layer deposition
Oh, Il-Kwon (Autor:in) / Yoo, Gilsang (Autor:in) / Yoon, Chang Mo (Autor:in) / Kim, Tae Hyung (Autor:in) / Yeom, Geun Young (Autor:in) / Kim, Kangsik (Autor:in) / Lee, Zonghoon (Autor:in) / Jung, Hanearl (Autor:in) / Lee, Chang Wan (Autor:in) / Kim, Hyungjun (Autor:in)
Applied surface science ; 387 ; 109-117
01.01.2016
9 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
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