A platform for research: civil engineering, architecture and urbanism
Very high frequency plasma reactant for atomic layer deposition
Very high frequency plasma reactant for atomic layer deposition
Very high frequency plasma reactant for atomic layer deposition
Oh, Il-Kwon (author) / Yoo, Gilsang (author) / Yoon, Chang Mo (author) / Kim, Tae Hyung (author) / Yeom, Geun Young (author) / Kim, Kangsik (author) / Lee, Zonghoon (author) / Jung, Hanearl (author) / Lee, Chang Wan (author) / Kim, Hyungjun (author)
Applied surface science ; 387 ; 109-117
2016-01-01
9 pages
Article (Journal)
English
DDC:
620.44
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Very high frequency plasma reactant for atomic layer deposition
British Library Online Contents | 2016
|Very high frequency plasma reactant for atomic layer deposition
British Library Online Contents | 2016
|Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
British Library Online Contents | 2017
|PLASMA-RESISTANT COATING OF POROUS BODY BY ATOMIC LAYER DEPOSITION
European Patent Office | 2018
|Properties of AlN grown by plasma enhanced atomic layer deposition
British Library Online Contents | 2011
|