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Electrical conduction mechanisms and dielectric relaxation in Al2O3 thin films deposited by thermal atomic layer deposition
Electrical conduction mechanisms and dielectric relaxation in Al2O3 thin films deposited by thermal atomic layer deposition
Electrical conduction mechanisms and dielectric relaxation in Al2O3 thin films deposited by thermal atomic layer deposition
Altuntas, Halit (Autor:in) / Kaplan, Kemal (Autor:in)
Materials science in semiconductor processing ; 86 ; 111-114
01.01.2018
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
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