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Improved Si/SiOx interface passivation by ultra-thin tunneling oxide layers prepared by rapid thermal oxidation
Improved Si/SiOx interface passivation by ultra-thin tunneling oxide layers prepared by rapid thermal oxidation
Improved Si/SiOx interface passivation by ultra-thin tunneling oxide layers prepared by rapid thermal oxidation
Gad, Karim M. (Autor:in) / Vössing, Daniel (Autor:in) / Balamou, Patrice (Autor:in) / Hiller, Daniel (Autor:in) / Stegemann, Bert (Autor:in) / Angermann, Heike (Autor:in) / Kasemann, Martin (Autor:in)
Applied surface science ; 353 ; 1269-1276
01.01.2015
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
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