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On interface properties of ultra-thin and very-thin oxide/a-Si:H structures prepared by oxygen based plasmas and chemical oxidation
On interface properties of ultra-thin and very-thin oxide/a-Si:H structures prepared by oxygen based plasmas and chemical oxidation
On interface properties of ultra-thin and very-thin oxide/a-Si:H structures prepared by oxygen based plasmas and chemical oxidation
Pincik, E. (Autor:in) / Kobayashi, H. (Autor:in) / Hajossy, R. (Autor:in) / Gleskova, H. (Autor:in) / Takahashi, M. (Autor:in) / Jergel, M. (Autor:in) / Brunner, R. (Autor:in) / Ortega, L. (Autor:in) / Kucera, M. (Autor:in) / Kral, M. (Autor:in)
APPLIED SURFACE SCIENCE ; 253 ; 6697-6715
01.01.2007
19 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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