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Preparation method of indium tin oxide evaporation target material
The invention relates to a preparation method of an ITO (indium tin oxide) evaporation target material. The preparation method comprises the following steps: (1) crushing a purified ITO target material waste material; (2) sieving the crushed powder by using a 20-40-mesh sieve, recovering larger crushed particles which are not sieved by the sieve, and standing by the powder which is sieved by the sieve; (3) sieving the powder with a 100-200-mesh sieve, wherein the powder which is not sieved with the sieve is coarse particles, and the powder which is sieved with the sieve is fine powder; (4) mixing the coarse particles and the fine powder with a PVA aqueous solution according to the volume ratio of the coarse particles to the fine powder being (5-8): (2-4); (5) granulating; (6) performing compression molding; and (7) sintering to obtain the indium tin oxide evaporation target material. According to the method, coarse particles made of ITO target waste are used as aggregate, fine powder is used as matrix powder, high-temperature passivation treatment is not needed, energy consumption is low, the technological process is simple, cost is low, efficiency is high, and the method is suitable for batch production.
本发明涉及一种氧化铟锡蒸镀靶材的制备方法,包括以下步骤:(1)取净化处理过的ITO靶材废料进行破碎;(2)破碎后的粉料,用20‑40目筛网过筛,未过筛网的较大碎颗粒回收,过筛网的粉料待用;(3)再将粉料用100‑200目筛网过筛,未过筛网的粉料为粗颗粒,过筛网的粉料为细粉;(4)按粗颗粒、细粉体积比例5‑8:2‑4计,取粗颗粒、细粉与PVA水溶液混合;(5)造粒;(6)压制成型;(7)烧结后得到氧化铟锡蒸镀靶材。该方法利用ITO靶材废料制成的粗颗粒作为骨料,细粉作为基质粉料,无需高温钝化处理,能耗低,工艺流程简单,成本低,效率高,适合批量生产。
Preparation method of indium tin oxide evaporation target material
The invention relates to a preparation method of an ITO (indium tin oxide) evaporation target material. The preparation method comprises the following steps: (1) crushing a purified ITO target material waste material; (2) sieving the crushed powder by using a 20-40-mesh sieve, recovering larger crushed particles which are not sieved by the sieve, and standing by the powder which is sieved by the sieve; (3) sieving the powder with a 100-200-mesh sieve, wherein the powder which is not sieved with the sieve is coarse particles, and the powder which is sieved with the sieve is fine powder; (4) mixing the coarse particles and the fine powder with a PVA aqueous solution according to the volume ratio of the coarse particles to the fine powder being (5-8): (2-4); (5) granulating; (6) performing compression molding; and (7) sintering to obtain the indium tin oxide evaporation target material. According to the method, coarse particles made of ITO target waste are used as aggregate, fine powder is used as matrix powder, high-temperature passivation treatment is not needed, energy consumption is low, the technological process is simple, cost is low, efficiency is high, and the method is suitable for batch production.
本发明涉及一种氧化铟锡蒸镀靶材的制备方法,包括以下步骤:(1)取净化处理过的ITO靶材废料进行破碎;(2)破碎后的粉料,用20‑40目筛网过筛,未过筛网的较大碎颗粒回收,过筛网的粉料待用;(3)再将粉料用100‑200目筛网过筛,未过筛网的粉料为粗颗粒,过筛网的粉料为细粉;(4)按粗颗粒、细粉体积比例5‑8:2‑4计,取粗颗粒、细粉与PVA水溶液混合;(5)造粒;(6)压制成型;(7)烧结后得到氧化铟锡蒸镀靶材。该方法利用ITO靶材废料制成的粗颗粒作为骨料,细粉作为基质粉料,无需高温钝化处理,能耗低,工艺流程简单,成本低,效率高,适合批量生产。
Preparation method of indium tin oxide evaporation target material
一种氧化铟锡蒸镀靶材的制备方法
ZHANG BEIWEI (Autor:in) / LU YINGDONG (Autor:in) / WANG KAI (Autor:in) / LIANG YINGXIANG (Autor:in) / SONG CHUNHUA (Autor:in)
30.07.2021
Patent
Elektronische Ressource
Chinesisch
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