Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Sputtering target and method for producing same
The present invention relates to a sputtering target capable of using a warped cylindrical base material as a constituent material, and a method for manufacturing the same, and provides a novel method for manufacturing a sputtering target in which warpage of a cylindrical base material can be eliminated even if the axial length of the cylindrical target material is long or even if the cylindrical target material is heated when being filled with a bonding material. The present invention proposes a method for manufacturing a sputtering target, which is characterized in that the degree of warping of a cylindrical base material is measured, processing is performed for warping the cylindrical base material in a direction opposite to the direction in which the cylindrical base material is warped, and a plurality of cylindrical target materials are arranged on the outside of the processed cylindrical base material at intervals in the axial direction. And bonding the cylindrical base material and the cylindrical target material with a bonding material.
本发明涉及能够将翘曲了的圆筒形基材用作构成材料的溅射靶及其制造方法，提供一种新型的溅射靶的制造方法，其中，即使圆筒形靶材的轴向长度较长，或者即使经过接合材料填充时的加热，也能够消除圆筒形基材的翘曲。本发明提出了一种溅射靶的制造方法，其特征在于，测定圆筒形基材的翘曲幅度，进行使圆筒形基材向与翘曲了的方向相反的方向翘曲的加工，在上述加工后的圆筒形基材的外侧，沿轴向隔开间隔地排列配置多个圆筒形靶材，用接合材料将上述圆筒形基材与上述圆筒形靶材接合。
Sputtering target and method for producing same
The present invention relates to a sputtering target capable of using a warped cylindrical base material as a constituent material, and a method for manufacturing the same, and provides a novel method for manufacturing a sputtering target in which warpage of a cylindrical base material can be eliminated even if the axial length of the cylindrical target material is long or even if the cylindrical target material is heated when being filled with a bonding material. The present invention proposes a method for manufacturing a sputtering target, which is characterized in that the degree of warping of a cylindrical base material is measured, processing is performed for warping the cylindrical base material in a direction opposite to the direction in which the cylindrical base material is warped, and a plurality of cylindrical target materials are arranged on the outside of the processed cylindrical base material at intervals in the axial direction. And bonding the cylindrical base material and the cylindrical target material with a bonding material.
本发明涉及能够将翘曲了的圆筒形基材用作构成材料的溅射靶及其制造方法，提供一种新型的溅射靶的制造方法，其中，即使圆筒形靶材的轴向长度较长，或者即使经过接合材料填充时的加热，也能够消除圆筒形基材的翘曲。本发明提出了一种溅射靶的制造方法，其特征在于，测定圆筒形基材的翘曲幅度，进行使圆筒形基材向与翘曲了的方向相反的方向翘曲的加工，在上述加工后的圆筒形基材的外侧，沿轴向隔开间隔地排列配置多个圆筒形靶材，用接合材料将上述圆筒形基材与上述圆筒形靶材接合。
Sputtering target and method for producing same
溅射靶及其制造方法
TERAMURA KYOSUKE (Autor:in)
21.06.2022
Patent
Elektronische Ressource
Chinesisch
| Europäisches Patentamt | 2020