Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Molybdenum trioxide sputtering target material, preparation method and target material mold
The invention provides a molybdenum trioxide sputtering target material, a preparation method and a target material mold. The preparation method comprises the following steps: carrying out spray granulation on a molybdenum trioxide powder solution serving as a raw material to prepare spheroidic molybdenum trioxide powder, filling the spheroidic molybdenum trioxide powder into a target mold, and sequentially carrying out hydraulic pressing, hot pressing treatment and processing treatment to prepare the molybdenum trioxide sputtering target, the purity of the molybdenum trioxide sputtering target is greater than 99.95%, and the molybdenum trioxide sputtering target can be used for preparing the molybdenum trioxide sputtering target. And the density is greater than 99.5%. According to the preparation method of the molybdenum trioxide sputtering target material, a process of combining spray granulation and hot pressing is adopted, and a specially-made target material mold is matched, so that the finally prepared high-purity and high-density molybdenum trioxide sputtering target material can meet actual requirements.
本发明提供了一种三氧化钼溅射靶材、制备方法以及靶材模具。该制备方法先以三氧化钼粉末溶液为原料进行喷雾造粒后，制得类球形三氧化钼粉末，再将类球形三氧化钼粉末装填入靶材模具中，依次经过液压压制、热压处理和加工处理后，制得三氧化钼溅射靶材，该三氧化钼溅射靶材的纯度大于99.95％，致密度大于99.5％。本发明的三氧化钼溅射靶材的制备方法，采用喷雾造粒和热压相结合的工艺，配合特制的靶材模具，最终制得的高纯度、高致密度的三氧化钼溅射靶材能够满足实际需求。
Molybdenum trioxide sputtering target material, preparation method and target material mold
The invention provides a molybdenum trioxide sputtering target material, a preparation method and a target material mold. The preparation method comprises the following steps: carrying out spray granulation on a molybdenum trioxide powder solution serving as a raw material to prepare spheroidic molybdenum trioxide powder, filling the spheroidic molybdenum trioxide powder into a target mold, and sequentially carrying out hydraulic pressing, hot pressing treatment and processing treatment to prepare the molybdenum trioxide sputtering target, the purity of the molybdenum trioxide sputtering target is greater than 99.95%, and the molybdenum trioxide sputtering target can be used for preparing the molybdenum trioxide sputtering target. And the density is greater than 99.5%. According to the preparation method of the molybdenum trioxide sputtering target material, a process of combining spray granulation and hot pressing is adopted, and a specially-made target material mold is matched, so that the finally prepared high-purity and high-density molybdenum trioxide sputtering target material can meet actual requirements.
本发明提供了一种三氧化钼溅射靶材、制备方法以及靶材模具。该制备方法先以三氧化钼粉末溶液为原料进行喷雾造粒后，制得类球形三氧化钼粉末，再将类球形三氧化钼粉末装填入靶材模具中，依次经过液压压制、热压处理和加工处理后，制得三氧化钼溅射靶材，该三氧化钼溅射靶材的纯度大于99.95％，致密度大于99.5％。本发明的三氧化钼溅射靶材的制备方法，采用喷雾造粒和热压相结合的工艺，配合特制的靶材模具，最终制得的高纯度、高致密度的三氧化钼溅射靶材能够满足实际需求。
Molybdenum trioxide sputtering target material, preparation method and target material mold
一种三氧化钼溅射靶材、制备方法以及靶材模具
XI SHA (Autor:in) / CUI YUQING (Autor:in) / ZHOU SHA (Autor:in) / ZHU QI (Autor:in) / YANG QINLI (Autor:in) / ZHANG XIAO (Autor:in) / LI JING (Autor:in)
12.07.2022
Patent
Elektronische Ressource
Chinesisch