Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Plasma-resistant coating film, sol-gel solution for forming same, method for forming plasma-resistant coating film, and substrate with plasma-resistant coating film
This plasma-resistant coating film is formed on a substrate, contains crystalline Y2O3 particles having an average particle diameter of 0.5-5.0 [mu] m in a SiO2 film, and has a film density of 90% or more as determined from formula (1) by image analysis of a film cross-section using a scanning electron microscope. The pores in the film have a diameter of 5 [mu] m or less, and the rate of peeling from the substrate as determined by a cross-cut test of the film is 5% or less. Membrane density (%) = [(S1-S2)/S1] * 100 (1) (In formula (1), S1 is the area of the membrane, and S2 is the area of the pore portion in the membrane.
本发明的耐等离子体涂膜为一种如下的耐等离子体涂膜，其形成于基材上，在SiO2膜中包含平均粒径为0.5μm～5.0μm的结晶性Y2O3粒子，通过利用扫描型电子显微镜对膜截面进行图像分析并由下述式(1)求出的膜密度为90％以上，膜中的孔隙的尺寸为直径5μm以下，且基于膜的划格试验所得的从所述基材的剥离率为5％以下。膜密度(％)＝[(S1‑S2)/S1]×100(1)，其中，在式(1)中，S1为膜的面积，S2为膜中的孔隙部分的面积。
Plasma-resistant coating film, sol-gel solution for forming same, method for forming plasma-resistant coating film, and substrate with plasma-resistant coating film
This plasma-resistant coating film is formed on a substrate, contains crystalline Y2O3 particles having an average particle diameter of 0.5-5.0 [mu] m in a SiO2 film, and has a film density of 90% or more as determined from formula (1) by image analysis of a film cross-section using a scanning electron microscope. The pores in the film have a diameter of 5 [mu] m or less, and the rate of peeling from the substrate as determined by a cross-cut test of the film is 5% or less. Membrane density (%) = [(S1-S2)/S1] * 100 (1) (In formula (1), S1 is the area of the membrane, and S2 is the area of the pore portion in the membrane.
本发明的耐等离子体涂膜为一种如下的耐等离子体涂膜，其形成于基材上，在SiO2膜中包含平均粒径为0.5μm～5.0μm的结晶性Y2O3粒子，通过利用扫描型电子显微镜对膜截面进行图像分析并由下述式(1)求出的膜密度为90％以上，膜中的孔隙的尺寸为直径5μm以下，且基于膜的划格试验所得的从所述基材的剥离率为5％以下。膜密度(％)＝[(S1‑S2)/S1]×100(1)，其中，在式(1)中，S1为膜的面积，S2为膜中的孔隙部分的面积。
Plasma-resistant coating film, sol-gel solution for forming same, method for forming plasma-resistant coating film, and substrate with plasma-resistant coating film
耐等离子体涂膜、该膜形成用溶胶凝胶液、耐等离子体涂膜的形成方法及带有耐等离子体涂膜的基材
TSUJIUCHI NAOTO (Autor:in) / TATSUMI KOJI (Autor:in) / SHIONO ICHIRO (Autor:in)
09.05.2023
Patent
Elektronische Ressource
Chinesisch
IPC:
C04B
Kalk
,
LIME
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