Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Plasma-resistant coating film, method for producing same, and plasma-resistant member
A method for producing a plasma-resistant coating film according to the present invention comprises: a first step for forming a lower coating layer by applying a first rare earth metal compound powder, which contains 90-99.9 wt% of first rare earth metal compound particles and 0.1-10 wt% of silicon (SiO2) particles, on an object to be coated by a thermal spray process; a second step of subjecting the surface of the first rare earth metal compound coating layer formed in the first step to surface processing so as to provide an average surface roughness of 1 to 6 [mu] m on the surface of the first rare earth metal compound coating layer; and a third step of forming an upper coating layer by coating particles of a second rare earth metal compound on the first rare earth metal compound coating layer subjected to surface processing in the second step by a suspension plasma thermal spraying process, as a result, a compact, chemically stable plasma-resistant coating film having improved withstand voltage characteristics can be obtained.
根据本发明的耐等离子体涂布膜的制造方法，其包括：第一步骤，通过热喷涂工艺将包含90～99.9wt％的第一稀土类金属化合物颗粒和0.1～10wt％的硅(SiO2)颗粒的第一稀土类金属化合物粉末涂布在涂布对象物上形成下部涂层的步骤；第二步骤，通过对所述第一步骤中形成的第一稀土类金属化合物涂层进行表面加工来使所述第一稀土类金属化合物涂层的表面具有1至6μm的平均表面粗糙度的步骤；以及第三步骤，通过悬浮液等离子体热喷涂工艺将第二稀土类金属化合物颗粒涂布在执行所述第二步骤的表面加工的第一稀土类金属化合物涂层上形成上部涂层的步骤，从而能够获得致密、化学稳定且提高了耐电压特性的耐等离子体涂布膜。
Plasma-resistant coating film, method for producing same, and plasma-resistant member
A method for producing a plasma-resistant coating film according to the present invention comprises: a first step for forming a lower coating layer by applying a first rare earth metal compound powder, which contains 90-99.9 wt% of first rare earth metal compound particles and 0.1-10 wt% of silicon (SiO2) particles, on an object to be coated by a thermal spray process; a second step of subjecting the surface of the first rare earth metal compound coating layer formed in the first step to surface processing so as to provide an average surface roughness of 1 to 6 [mu] m on the surface of the first rare earth metal compound coating layer; and a third step of forming an upper coating layer by coating particles of a second rare earth metal compound on the first rare earth metal compound coating layer subjected to surface processing in the second step by a suspension plasma thermal spraying process, as a result, a compact, chemically stable plasma-resistant coating film having improved withstand voltage characteristics can be obtained.
根据本发明的耐等离子体涂布膜的制造方法，其包括：第一步骤，通过热喷涂工艺将包含90～99.9wt％的第一稀土类金属化合物颗粒和0.1～10wt％的硅(SiO2)颗粒的第一稀土类金属化合物粉末涂布在涂布对象物上形成下部涂层的步骤；第二步骤，通过对所述第一步骤中形成的第一稀土类金属化合物涂层进行表面加工来使所述第一稀土类金属化合物涂层的表面具有1至6μm的平均表面粗糙度的步骤；以及第三步骤，通过悬浮液等离子体热喷涂工艺将第二稀土类金属化合物颗粒涂布在执行所述第二步骤的表面加工的第一稀土类金属化合物涂层上形成上部涂层的步骤，从而能够获得致密、化学稳定且提高了耐电压特性的耐等离子体涂布膜。
Plasma-resistant coating film, method for producing same, and plasma-resistant member
耐等离子体涂布膜、其制造方法以及耐等离子体构件
JEONG DONGHOON (Autor:in) / BANG SUNG-SIK (Autor:in) / JEONG JAE-IM (Autor:in) / KIM DAE-SUNG (Autor:in)
28.02.2023
Patent
Elektronische Ressource
Chinesisch
| Europäisches Patentamt | 2023
| Europäisches Patentamt | 2022