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PLASMA-RESISTANT COATING FILM, SOL GEL LIQUID FOR FORMING SAID FILM, METHOD FOR FORMING PLASMA-RESISTANT COATING FILM, AND SUBSTRATE WITH PLASMA-RESISTANT COATING FILM
The plasma-resistant coating film according to the present invention is formed on a substrate, including crystalline Y2O3 particles having an average particle diameter of 0.5 µm to 5.0 µm in a SiO2 film, in which a film density of the plasma-resistant coating film is 90% or more, the film density being obtained by performing image analysis of a cross section of the film with an electron scanning microscope and by using the following expression (1), a size of pores in the film is 5 µm or less in terms of diameter, and a peeling rate of the film from the substrate measured by performing a cross-cut test is 5% or less. Filmdensity%=S1−S2/S1×100However, in the expression (1), S1 is an area of the film and S2 is an area of a pore portion in the film.
PLASMA-RESISTANT COATING FILM, SOL GEL LIQUID FOR FORMING SAID FILM, METHOD FOR FORMING PLASMA-RESISTANT COATING FILM, AND SUBSTRATE WITH PLASMA-RESISTANT COATING FILM
The plasma-resistant coating film according to the present invention is formed on a substrate, including crystalline Y2O3 particles having an average particle diameter of 0.5 µm to 5.0 µm in a SiO2 film, in which a film density of the plasma-resistant coating film is 90% or more, the film density being obtained by performing image analysis of a cross section of the film with an electron scanning microscope and by using the following expression (1), a size of pores in the film is 5 µm or less in terms of diameter, and a peeling rate of the film from the substrate measured by performing a cross-cut test is 5% or less. Filmdensity%=S1−S2/S1×100However, in the expression (1), S1 is an area of the film and S2 is an area of a pore portion in the film.
PLASMA-RESISTANT COATING FILM, SOL GEL LIQUID FOR FORMING SAID FILM, METHOD FOR FORMING PLASMA-RESISTANT COATING FILM, AND SUBSTRATE WITH PLASMA-RESISTANT COATING FILM
PLASMABESTÄNDIGER BESCHICHTUNGSFILM, SOL-GEL-FLÜSSIGKEIT ZUR BILDUNG DES FILMS, VERFAHREN ZUR BILDUNG DES PLASMABESTÄNDIGEN BESCHICHTUNGSFILMS UND SUBSTRAT MIT PLASMABESTÄNDIGEM BESCHICHTUNGSFILM
FILM DE REVÊTEMENT RÉSISTANT AU PLASMA, LIQUIDE SOL-GEL POUR FORMER LEDIT FILM, PROCÉDÉ DE FORMATION D'UN FILM DE REVÊTEMENT RÉSISTANT AU PLASMA ET SUBSTRAT AVEC FILM DE REVÊTEMENT RÉSISTANT AU PLASMA
TSUJIUCHI NAOTO (Autor:in) / TATSUMI KOJI (Autor:in) / SHIONO ICHIRO (Autor:in)
19.07.2023
Patent
Elektronische Ressource
Englisch
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